We develop new materials for photolithography. In particlar, we are interested in developing of new photosensitive materials with stimuli-responsive properties. These materials are extremetly suitable for biopatterning i.e. patterning of proteins and cells on surfaces
Scheme of photopatterning using poly(N-isopropylacrylamide)-based photoresists with temperature-triggered development. Thermoresponsive poly(2-nitrobenzyl acrylate-co-N isopropylacrylamide) is deposited as photoresist onto a substrate (a). Illumination of the photoresist (b) results in photo-cleavage of nitrobenzyl acrylate groups, increasing the LCST. After the photoresist pattern is developed at slightly lower temperature (c), proteins are adsorbed (d). The photoresist (together with the proteins on top) can be completely removed in aqueous environment at low temperatures (e).
Ionov, Leonid; Diez, Stefan
Environment-Friendly Photolithography Using Poly(N-isopropylacrylamide)-Based Thermoresponsive Photoresists
in Journal of the American Chemical Society vol. 131 (2009) issue 37. - pp. 13315-13319
Ionov, Leonid; Synytska, Alla; Diez, Stefan
Temperature-Induced Size-Control of Bioactive Surface Patterns
in Advanced Functional Materials vol. 18 (2008) issue 10. - pp. 1501-1508